OPTIspin ST23 - Spin Coating and Cleaning
Product Information
The future technology in the semiconductor industry and production-
Stand alone spinner module for coating; cleaning, developing, hotplate and HMDS within processOPTIspin ST 23
- Stand - Alone Spinner System for Coating, Cleaning or Developing applications with hotplate and HMDS (HexaMethylDiSilazan - C6H19NSi2) hotplate for wafer up to Ø 8" (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)
System consists of:
- Stand - Alone cabinet with all process modules integrated
- Spinner system with process bowl cover (hardware interlock secured)
- Multi piece process bowl (easily dismountable for cleaning purposes) with splash ring
- Hotplate OPTIhot HB 20 with lifting pins for 2" up to 8"
- Vapor prime HMDS (HexaMethylDiSilazan) hotplate OPTIhot VB 20
- Input display unit with touch for spin coater and HMDS HP
- Temperature controller and timer for hotplate
- USB 2.0 port for data exchange
- Including software for PC / Notebook - For more comfortable recipe writing and storage
- Including an ENGLISH manual on standard paper and a CD-ROM
- Price without installation and training
- Requires at least one chuck (Not included !)
Technical Data:
- Voltage: UAC= 3 x 400 V / N / PE / 50 Hz (60 Hz) / 16A
- Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
- Process exhaust: Outer diameter OD 110 mm, 200m3/h
- Cabinet exhaust #1: Outer diameter OD 110 mm, 200m3/h
- Cabinet / HP exhaust #2: Outer diameter OD 110 mm, 200m3/h
- Process exhaust HMDS: Outer diameter OD 110 mm, 200m3/h
- Cabinet exhaust HMDS: Outer diameter OD 110 mm, 200m3/h
- Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
- Vacuum: -0.8 ± 0.2 bar
- Nitrogen (N2): 4.0 ± 0.5 bar
- CE marked system
Chucks: Option
Dispense: Option
Nozzle: Options
Hotplate: Option