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OPTIhot SHT20 - Hotplate

OPTIhot SHT20 - Hotplate

  • Product Information

    The future technology in the semi conductor industry and production-
    stand alone Hotplate System for typical lithography baking applications:

    OPTIhot SHT 20

    •  Stand - Alone Hotplate System for wafers up to Ø 8"
      (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)

    System consists of:

    • Stand - Alone Cabinet with integrated Hotplate
    • Hotplate System with cover
    • Lifting pins after process for 2" - 8" wafer 
    • Input controller
    • Preset and calibrated temperature controller
    • Including an ENGLISH manual on standard paper and a CD-ROM
    • Hotplate System with cover and controller
    • Price without installation and training

    Technical data:

    • Voltage: UAC= 110 V / N / PE / 60 Hz / 16A or UAC= 230 V / N / PE / 50 Hz / 16A 
    • Temperature range: Up to 300°C - Adjustable in 1°C steps
    • Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
    • Substrate Size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
    • Process exhaust: Outer diameter OD 110 mm, 30m3/h
    • Cabinet exhaust: Outer diameter OD 110 mm, 200m3/h
    • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
    • Vacuum: -0.8 ± 0.2 bar
    • Nitrogen (N2): 4.0 ± 0.5 bar
    • CE marked system
    • Dimensions (W x D x H):
    • Input Touch - Panel approx.: 166 mm x 45 mm x 100 mm (4.7" x 1.8" x 3.9")
    • OPTIhot SHT 20 approx.: 600 mm x 600 mm x 1.320 mm (23.6" x 23.6" x 52")

    Hotplate Options

    • "Proximity - manual adjustable proximity"
    • "Nitrogen (N2) blow - manual nitrogen blow - including media valve, tubing and flowmeter"

This is a customizable product with a very large amount of options available. Please contact our sales department for more information and support to get a product customized to your needs.

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