OPTIhot HB20+ - Hotplate

The future technology in the semi conductor industry and production-
bench mounted Hotplate System for typical lithography baking applications:

OPTIhot HB 20+

• Bench Mounted Hotplate System for wafer up to Ø 8" 
  (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)

System consists of:

• Hotplate System with cover
• Recipe programmable lifting pins (proximity) for 2" - 8" wafer 
• Recipe programmable Nitrogen (N2) blow
• 19" controller unit
• Input display unit with touch
• Preset and calibrated Temperature Controller
• Including software for PC / Notebook - For more comfortable
• recipe writing and storage
• Including an ENGLISH manual as download
• Price without installation and training
  
  Technical data:
• Voltage: UAC= 230 V / N / PE / 50 Hz (60 Hz) / 16A 
• Temperature range: Up to 250°C - Adjustable in 0.1°C steps
• Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
• Lifting pins (Proximity): From Ø 2" up to Ø 8" - Programmable in 0.1 mm steps
• Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
• Process exhaust: Outer diameter OD 38mm, 30m3/h
• Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen (N2): 4.0 ± 0.5 bar
• CE marked system