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OPTIwet SB 30 extended - Spin Wet

OPTIwet SB 30 extended - Spin Wet

  • Product Information

    The future technology in the semiconductor industry and production-
    Spin Wet Process System within process:


    OPTIwet SB 30 extended

    • Stand - Alone Spin Wet Process System for substrates up to 16“ (Ø 400 mm) and up to 12” x 12” (300 mm x 300 mm)


    System consists of:

    • Spinner system with closed process chamber
    • Process chamber made of polypropylene (PP) with safety door
    • Including one programmable electronic media arm – Programmable in speed and position
    • Including Back Side Rinse Nozzle for DI-Water
    • Emergency Stop Button 
    • Input display unit with touch screen
    • USB 2.0 port for data exchange
    • Including software for PC / Notebook – For more comfortable recipe writing and storage
    • Including an ENGLISH manual on standard paper and a CD-ROM
    • Price without installation and training
    • Requires at least one chuck
    • Various application possibilities in one spinner system


    Application possibilities:

    • Rinse and spin drying
    • Development with photo resist
    • Solvent applications (develop / strip)
    • Megasonic – Cleaning
    • High Pressure – Cleaning
    • Brush – Cleaning
    • Piranha – Cleaning
    • Standard – Cleaning 1 (SC 1)
    • Standard – Cleaning 2 (SC 2)
    • HF Last
    • Silicon, Silicondioxid (SiO2) and Silicon Nitride (Si3N4) – Etch applications
    • Various metal etch applications
    • “Lift – Off“


    Technical data:

    • Voltage: UAC= 3 x 400 V / N / PE / 50 Hz / 16A
    • Speed: 1 – 4.000 rpm – adjustable in 1 rpm steps (pending on substrate size and load)
    • Acceleration ramp: 1 up to 3.000 rpm/s – adjustable in 1 rpm/s steps (pending on substrate size and load)
    • Spinning time: 1 up to 999 s – adjustable in 0.1 s steps
    • Substrate size: Up to Ø 16” or 12” x 12” (300 mm x 300 mm)
    • Process chamber: Standard made of Polypropylene (PP)
    • Process bowl exhaust:2 x outer diameter OD 110 mm, each 200m3/h
    • Chamber exhaust: 2 x outer diameter OD 140 mm, each 300m3/h
    • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
    • Vacuum: -0.8 ± 0.2 bar
    • Nitrogen (N2): 4.0 ± 0.5 bar
    • Media drain connection to the house drain
    • CE marked system

Dies ist ein kundenspezifisches Produkt bei dem eine sehr hohe Anzahl an Optionen zur Verfügung steht. Bitte kontaktieren Sie unseren Vertrieb für weitere Informationen und Unterstützung um ein auf Ihre Bedürfnisse angepasstes Produkt zu erhalten.

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