OPTIspin ST20 - Spin Coating and Cleaning
Product Information
The future technology in the semiconductor industry and production-
Stand Alone Spinner system for coating, cleaning and developing within process:OPTIspin ST 20
- Stand - Alone Spinner System for Coating, Cleaning or Developing applications for wafer up to Ø 8" (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)
System consists of:
- Stand - Alone cabinet with all process modules integrated
- Spinner system with process bowl cover (hardware interlock secured)
- Multi piece process bowl (easily dismountable for cleaning purposes) with splash ring
- Input display unit with touch
- USB 2.0 port for data exchange
- Including software for PC / Notebook - For more comfortable recipe writing and storage
- Including an ENGLISH manual as download
- Price without installation and training
- Requires at least one chuck (Not included !)
Technical data:
- Voltage: UAC = 3 x 400 V / N / PE / 50 Hz (60 Hz) / 16A
- Motor-Speed: 1 up to 10,000rpm* in 1rpm steps
- Motor-Acceleration ramp: 1 up to 50,000 rpm/sec* in steps
- 1rpm/sec *(depending on substrate size and load)
- Spinning time: 1 up to 999 s - Adjustable in 0.1 s steps
- Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
- Process bowl Standard made of Polypropylene (PP)
- Process exhaust: Outer diameter OD 110 mm, 200m3/h
- Cabinet exhaust #1: Outer diameter OD 110 mm, 200m3/h
- Cabinet exhaust #2: Outer diameter OD 110 mm, 200m3/h
- Drain: 5 liter waste tank and high-level sensor, inside the cabinet
- Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
- Vacuum: -0.8 ± 0.2 bar
- Nitrogen (N2): 4.0 ± 0.5 bar
- CE marked system
Chucks: Option
Dispense: Option
Nozzle: Option
Hotplate: Option