OPTIhot SHT30+ - Hotplate
Product Information
The future technology in the semi conductor industry and production-
stand alone Hotplate System for typical lithography baking applications:OPTIhot SHT 30+
- Stand Alone Hotplate System for wafer up to Ø 12" (Ø 300 mm) and substrates up to 9" x 9" (225 mm x 225 mm)
System consists of:
- Stand Alone Cabinet with integrated Hotplate and controller
- Recipe programmable lifting pins (proximity) for 4" - 12" wafer
- Recipe programmable Nitrogen (N2) blow
- Input display unit with touch panel
- Preset and calibrated Temperature Controller
- Including software for PC / Notebook - For more comfortable recipe writing and storage
- Including an ENGLISH manual as download
- Price without installation and training
Technical data:
- Voltage: UAC= 110 V / N / PE / 60 Hz / 16A or UAC= 230 V / N / PE / 50 Hz / 16A
- Temperature range: Up to 250°C - Adjustable in 1°C steps
- Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
- Lifting pins (Proximity): From Ø 4" up to Ø 12" - Programmable in 0.1 mm steps
- Substrate size: Up to Ø 12" (Ø 300 mm) or 9" x 9" (225 mm x 225 mm)
- Process exhaust: Outer diameter OD 110 mm, 30m3/h
- Cabinet exhaust: Outer diameter OD 110 mm, 200m3/h
- Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
- Vacuum: -0.8 ± 0.2 bar
- Nitrogen (N2): 4.0 ± 0.5 bar
- CE marked system